Engineering of the Polysilicon Emtter Interfacial Layer using Low Temperature Thermal Re-Oxidation in an LPCVD Cluster Tool

Abstract

Today's high performance bipolar technologies rely upon stringent control of the polysilicon deposition and pre-deposition cleaning processes. The advent of LPCVD cluster tools allows more precise control of the interfacial layer through the use of insitu vapour cleaning and subsequent re-oxidation prior to poly deposition. In this paper, the use of… (More)

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