Electronic sputtering of solids by slow, highly charged ions: Fundamentals and applications

@article{Schenkel1999ElectronicSO,
  title={Electronic sputtering of solids by slow, highly charged ions: Fundamentals and applications},
  author={T. Schenkel and M. W. Newman and T. Niedermayr and G. Machicoane and J. McDonald and A. Barnes and A. Hamza and J. C. Banks and B. Doyle and K. J. Wu},
  journal={Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms},
  year={1999},
  volume={161},
  pages={65-75}
}
  • T. Schenkel, M. W. Newman, +7 authors K. J. Wu
  • Published 1999
  • Materials Science
  • Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms
Electronic sputtering in the interaction of slow (v < vBohr), highly charged ions (SHCI) with solid surfaces has been subject of controversial discussions for almost 20 years. We review results from recent studies of total sputtering yields and discuss distinct microscopic mechanisms (such as defect mediated desorption, Coulomb explosions and eAects of intense electronic excitation) in the response of insulators and semiconductors to the impact of SHCI. We then describe an application of ions… Expand
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Highly charged ions
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References

SHOWING 1-10 OF 148 REFERENCES
Potential sputtering of lithium fluoride by slow multicharged ions.
...
1
2
3
4
5
...