Electron cyclotron resonance plasma and thermal oxidation mechanisms of germanium

@inproceedings{Wang1994ElectronCR,
  title={Electron cyclotron resonance plasma and thermal oxidation mechanisms of germanium},
  author={Y. L. Wang and You Zhou Hu and Eugene A. Irene},
  year={1994}
}
The electron cyclotron resonance (ECR) plasma oxidation and thermal oxidation mechanisms for germanium were investigated using in situ spectroscopic and single wavelength ellipsometry. ECR plasma oxidation was performed at substrate temperatures of 80–400 °C while thermal oxidations were performed between 400 and 600 °C. Optical modeling shows that there is an interface between the oxide film and the substrate that is composed of germanium oxide and amorphous germanium. Fourier transform… CONTINUE READING

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