Electron-beam writing system and its application to large and high-density diffractive optic elements.

Abstract

An electron-beam writing system that is chartacterized by a stationary electron beam and a continuously spinning table is proposed and developed for diffractive optic elements with axisymmetric patterns. This system allows us to fabricate continuously concentric or radialized high-density microgratings with effective areas over the electron-beam deflection limits. For a fine electron-dose distribution, we adopted multiple-revolution writing and electron-beam modulation. Several test gratings, including a rotary encoder disk with a 1.57-µm grating pitch and a 15-mm diameter and a blazed micro-Fresnel lens with a 4.5-mm diameter and a N.A. of 0.45, are successfully demonstrated with real-time data processing.

DOI: 10.1364/AO.33.002032

Cite this paper

@article{Ogata1994ElectronbeamWS, title={Electron-beam writing system and its application to large and high-density diffractive optic elements.}, author={Sumitoshi Ogata and M. Tada and Motoki Yoneda}, journal={Applied optics}, year={1994}, volume={33 10}, pages={2032-8} }