Electron beam lithography with feedback using in situ self-developed resist

Abstract

Due to the lack of feedback, conventional electron beam lithography (EBL) is a 'blind' open-loop process where the exposed pattern is examined only after ex situ resist development, which is too late for any improvement. Here, we report that self-developing nitrocellulose resist, for which the pattern shows up right after exposure without ex situ… (More)
DOI: 10.1186/1556-276X-9-184

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