Electron Diffraction with Ten Nanometer Beam Size for Strain Analysis of Nanodevices

Abstract

A method to perform nano-beam diffraction (NBD) in a transmission electron microscope with high spatial resolution and low convergence angle is proposed. It is based on the use of a properly fabricated condenser aperture of 1 micron in diameter, which allows an electron beam about 10 nm in size to be focused on the sample, with a convergence angle in the 0.1 mrad range. Examples of NBD patterns taken in an untilted <110> cross section of a silicon device are shown. Their quality is adequate for spot position determination and hence to obtain in principle quantitative strain information. a Electronic mail: armigliato@bo.imm.cnr.it

Cite this paper

@inproceedings{Armigliato2008ElectronDW, title={Electron Diffraction with Ten Nanometer Beam Size for Strain Analysis of Nanodevices}, author={Aldo Armigliato and Stefano Frabboni and Gian Carlo Gazzadi}, year={2008} }