Electron Beam Lithography of HSQ and PMMA Resists and Importance of their Properties to Link the Nano World to the Micro World

@inproceedings{KaleliElectronBL,
  title={Electron Beam Lithography of HSQ and PMMA Resists and Importance of their Properties to Link the Nano World to the Micro World},
  author={B. Kaleli and Antonius A I Aarnink and S. Smits and Raymond J. E. Hueting and Rob A. M. Wolters and Jurriaan Schmitz}
}
— In this work we investigated the properties of HSQ and PMMA resists focusing on contrast and line width for e-beam lithography (EBL) application. HSQ was found to be a good candidate to have desired line widths but the contrast we obtained was less than it was for PMMA. Since the fluorine based plasma does not have high selectivity over exposed HSQ, we… CONTINUE READING