Electrodeposition and characterization of CoNiMnP-based permanent magnetic film for MEMS applications


Electroplated CoNiMnP-based permanent magnetic films with thickness of 4µm, 25µm and 43.5µm were fabricated and tested. Composed of 76.38 wt% Co, 16.66 wt% Ni, 3.64 wt% P and 2.32 wt% Mn, the films exhibited good surface morphology. In the case of 4µm thick film, we successfully achieved a high lateral coercivity of 711Oe, a… (More)
DOI: 10.1109/NEMS.2011.6017369


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