Electrodeposit tree patterns in linear cells: Experiment and computer models

  • R. D. Pochy
  • Published 2002

Abstract

Fractal tree patterns are generated experimentally in electrodeposits of C u S P 4 in thin linear cells with relatively high voltages (15-30 V across two copper electrodes of separation 3.8 cm). The tree separations, tree widths and heights, and tree statistics are analysed. Tree pattern from two two-dimensional computer models, the three-directions biased random walk (BRW) model and the dielectric breakdown model (DBM) with probability cut-off, are produced. The BRW model compares very well with our experimental data. There is a minimum in the Nm versus m curve where Nm is the number of trees with mass m. For m small, N m ~ m -~ with 0 < z < 1, in contrast to the D L A result that 1.< z < 2. The fractal dimension of the tree D varies linearly with the fractal dimension of the walker Dw, which also differs from the D L A results of Matsushi ta et al. The DBM with cut-off gives trees with too much ramification compared to the experimental results, and fails to produce the sharp structure transition lines observed in previous electrodeposit experiments.

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Cite this paper

@inproceedings{Pochy2002ElectrodepositTP, title={Electrodeposit tree patterns in linear cells: Experiment and computer models}, author={R. D. Pochy}, year={2002} }