Electroanalytical performance of carbon films with near-atomic flatness.

@article{Ranganathan2001ElectroanalyticalPO,
  title={Electroanalytical performance of carbon films with near-atomic flatness.},
  author={Sushilee Ranganathan and Richard L McCreery},
  journal={Analytical chemistry},
  year={2001},
  volume={73 5},
  pages={893-900}
}
Physicochemical and electrochemical characterization of carbon films obtained by pyrolyzing a commercially available photoresist has been performed. Photoresist spin-coated on to a silicon wafer was pyrolyzed at 1,000 degrees C in a reducing atmosphere (95% nitrogen and 5% hydrogen) to produce conducting carbon films. The pyrolyzed photoresist films (PPF) show unusual surface properties compared to other carbon electrodes. The surfaces are nearly atomically smooth with a root-mean-square… CONTINUE READING
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