Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum.

Abstract

We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 ±1.0 nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the enhanced sensitivity as a function of spatial frequency. The ability of the probes to reproduce high aspect-ratio features is illustrated by imaging a close-packed array of nanospheres. The electrical resistance of the probes is measured to be of order 100 kΩ.

DOI: 10.1016/j.ultramic.2013.05.005

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Cite this paper

@article{Brown2013ElectricallyCU, title={Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum.}, author={Jason B Brown and Paul Kocher and Chandra S. Ramanujan and David W. N. Sharp and Keiichi Torimitsu and J Mark F Ryan}, journal={Ultramicroscopy}, year={2013}, volume={133}, pages={62-6} }