Electric-field screening in atomically thin layers of MoS₂: the role of interlayer coupling.

Abstract

1 Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft (The Netherlands). 2 Instituto de Ciencia de Materiales de Madrid. CSIC, Sor Juana Ines de la Cruz 3. 28049 Madrid, Spain. 3 Institute for Complex Systems (ISC), CNR, U.O.S. Sapienza, v. dei Taurini 19, 00185 Rome, Italy 4 Departamento de Física de la Materia Condensada. Universidad Autónoma de Madrid, Campus de Cantoblanco. E-28049 Madrid (Spain). 5 Instituto Madrileño de Estudios Avanzados en Nanociencia IMDEA-Nanociencia. E-28049 Madrid (Spain).

DOI: 10.1002/adma.201203731

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Cite this paper

@article{CastellanosGomez2013ElectricfieldSI, title={Electric-field screening in atomically thin layers of MoS₂: the role of interlayer coupling.}, author={Andres Castellanos-Gomez and Emmanuele Cappelluti and Rafael Rold{\'a}n and Nicol{\'a}s Agra{\"{i}t and Francisco Guinea and Gabino Rubio-Bollinger}, journal={Advanced materials}, year={2013}, volume={25 6}, pages={899-903} }