Effect of polarization forces on carbon deposition on a non-spherical nanoparticle. Monte Carlo simulations

  title={Effect of polarization forces on carbon deposition on a non-spherical nanoparticle. Monte Carlo simulations},
  author={Valerian Nemchinsky and Alexander Khrabry},
  journal={Physics of Plasmas},
Trajectories of a polarizable species (atoms or molecules) in the vicinity of a negatively charged nanoparticle (at a floating potential) are considered. The atoms are pulled into regions of strong electric field by polarization forces. The polarization increases the deposition rate of the atoms and molecules at the nanoparticle. The effect of the non-spherical shape of the nanoparticle is investigated by the Monte Carlo method. The shape of the non-spherical nanoparticle is approximated by an… 
3 Citations

Figures and Tables from this paper

Dynamic modeling of carbon nanofiber growth in strong electric fields via plasma-enhanced chemical vapor deposition

Plasma enhanced chemical vapor deposition is an important method in the synthesis of carbon nanofibers which have been widely used in many technologies. Previous work devoted to the theoretical

Collision between a charged particle and a polarizable neutral particle in plasmas

The collision of a polarizable neutral particle with a charged particle in plasmas is studied. The neutral particle interaction with a charged particle is considered to be due to an induced dipole



Polarization forces in the vicinity of nanoparticles in weakly ionized plasma

It is shown that the polarization forces in a weakly ionized plasma lead to a substantial increase in the fluxes of neutral atoms and molecules to the surface of charged nanoparticles. Thus, the

Cross-sections for neutral atoms and molecules collisions with charged spherical nanoparticle

This paper presents cross sections for collisions of neutral atoms/molecules with a charged spherical nanoparticle, which is the source of the dipole potential. The accuracy of the orbital limited

Deposition kinetics on particles in a dusty plasma reactor

We report on the use of dusty plasma chemical vapor deposition for the coating of micron and submicron sized particles. Particles are introduced into a capacitively coupled low-pressure plasma where

A kinetic model to study film deposition during dusty plasma chemical vapor deposition process

A simplistic numerical kinetic model to predict the deposited film morphology in dusty plasma chemical vapor deposition reactors is developed. The morphological accretion of a circular object is

Charging of particles in a plasma

Several models that predict the charge of particles in a plasma are reviewed. The simplest is based on orbit-limited probe theory. This basic model can be improved by adding several effects: charge

Plasma nanoscience: setting directions, tackling grand challenges

This review paper presents historical perspectives, recent advances and future directions in the multidisciplinary research field of plasma nanoscience. The current status and future challenges are

Plasma-aided nanofabrication: where is the cutting edge?

Plasma-aided nanofabrication is a rapidly expanding area of research spanning disciplines ranging from physics and chemistry of plasmas and gas discharges to solid state physics, materials science,

Nonthermal plasma synthesis of semiconductor nanocrystals

Semiconductor nanocrystals have attracted considerable interest for a wide range of applications including light-emitting devices and displays, photovoltaic cells, nanoelectronic circuit elements,

Thermophysical properties of carbon–argon and carbon–helium plasmas

The calculated values of thermodynamic and transport properties of mixtures of carbon and argon, and carbon and helium, at high temperatures are presented in this paper. The thermodynamic properties