Effect of deposition temperature to electrical, structural and optical properties of amorphous carbon thin film prepared by TCVD

Abstract

Amorphous carbon (a-C) thin films have been prepared by thermal chemical vapor deposition (TCVD) technique at different temperature. The preparation involved argon (Ar), and camphor as carrier gas and carbon source respectively. The effects of deposition temperature in the a-C thin film on electrical, structural and optical properties was characterized by… (More)

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