Effect of added homopolymer on structures of thin films of PS-b-PDMS/PS mixture under solvent vapor annealing

@inproceedings{Yang2011EffectOA,
  title={Effect of added homopolymer on structures of thin films of PS-b-PDMS/PS mixture under solvent vapor annealing},
  author={Jinghui Yang and Qi Wang and Weiwei Yao and Feng Chen and Qiang Fu},
  year={2011}
}
Abstract Self assembly of poly(styrene- b -dimethylsiloxane) (PS- b -PDMS) followed by reactive ion etching technique is a promising method for fabricating periodical silica nanopatterns and can be applicable for device fabrication on nanoscale. We demonstrated a technologically useful way to control the inorganic silica nanostructures in thin films by directly mixing asymmetric (PS- b -PDMS) diblock copolymer with homopolymers of majority component, polystyrene (PS) under solvent vapor… CONTINUE READING