Effect of Mask Discretization on Performance of Silicon Arrayed Waveguide Gratings

Abstract

We studied the impact of the lithography mask discretization on silicon arrayed waveguide grating (AWG) performance. When we decreased the mask grid from 5 to 1 nm, we observed an experimental improvement in crosstalk of 2.7-6 dB and cumulative crosstalk improvement of 1.2-5 dB, depending on the wavelength channel spacing and the number of output channels… (More)

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