Effect of Mask Discretization on Performance of Silicon Arrayed Waveguide Gratings


We studied the impact of the lithography mask discretization on silicon arrayed waveguide grating (AWG) performance. When we decreased the mask grid from 5 to 1 nm, we observed an experimental improvement in crosstalk of 2.7-6 dB and cumulative crosstalk improvement of 1.2-5 dB, depending on the wavelength channel spacing and the number of output channels… (More)


7 Figures and Tables


Citations per Year

Citation Velocity: 11

Averaging 11 citations per year over the last 3 years.

Learn more about how we calculate this metric in our FAQ.