Effect of Cu+ ion implantation on crystalline orientation in polycrystalline Cu investigated by Kr penetration measurements

@inproceedings{Smith1980EffectOC,
  title={Effect of Cu+ ion implantation on crystalline orientation in polycrystalline Cu investigated by Kr penetration measurements},
  author={Harlan J. Smith and G. N. van Wyk},
  year={1980}
}
Abstract A series of 7 polycrystalline Cu targets was bombarded with successively increased doses of 40 keV Cu+ ions. Afterwards a trace amount of 40 keV radioactive 85Kr+ was injected into each target. The penetration of the Kr in the targets was then investigated by sequential 5 keV Ar+ ion sputtering and radioactivity counting. The results reveal that the penetration of the Kr increases systematically with dose of Cu prebombardment. This implies an enhanced probability of channelling due to… CONTINUE READING