ECO-Map: Technology remapping for post-mask ECO using simulated annealing

@article{Modi2008ECOMapTR,
  title={ECO-Map: Technology remapping for post-mask ECO using simulated annealing},
  author={Nilesh A. Modi and Malgorzata Marek-Sadowska},
  journal={2008 IEEE International Conference on Computer Design},
  year={2008},
  pages={652-657}
}
With transistor mask costs soaring and the delays associated with full design re-spins escalating, post-mask Engineering Change Orders (ECOs) - design changes after the masks have been prepared - are increasingly carried out by keeping transistor masks intact and revising only the metal masks. In this paper, we propose a novel design flow for achieving… CONTINUE READING