E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters

@article{Yuan2012EBeamLS,
  title={E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters},
  author={Kun Yuan and Bei Yu and David Z. Pan},
  journal={IEEE Trans. on CAD of Integrated Circuits and Systems},
  year={2012},
  volume={31},
  pages={167-179}
}
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