Double patterning lithography friendly detailed routing with redundant via consideration

@article{Yuan2009DoublePL,
  title={Double patterning lithography friendly detailed routing with redundant via consideration},
  author={Kun Yuan and Katrina Lu and David Z. Pan},
  journal={2009 46th ACM/IEEE Design Automation Conference},
  year={2009},
  pages={63-66}
}
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achieve high quality solution for DPL-unfriendly designs, due to complex 2D patterns in lower metal layers. Therefore, DPL-friendliness is needed at routing stage [3]. Another key yield improvement technique is redundant via insertion [4] [5]. However, this would increase the complexity in DPL-compliance. To make designs… CONTINUE READING
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