Doppler writing and linewidth control for scanning beam interference lithography

  title={Doppler writing and linewidth control for scanning beam interference lithography},
  author={Juan Montoya and C. Chang and R. Heilmann and M. Schattenburg},
  journal={Journal of Vacuum Science & Technology B},
  • Juan Montoya, C. Chang, +1 author M. Schattenburg
  • Published 2005
  • Chemistry
  • Journal of Vacuum Science & Technology B
  • Scanning beam interference lithography (SBIL) is a technique which is used to create large-area periodic patterns with high phase accuracy. This is accomplished by combining interference lithography and an X-Y scanning stage. We previously reported parallel scan mode in which the stage scans in a direction parallel to the interference fringes. Here we present a method called Doppler scanning. In this mode, the stage is scanned perpendicular to the interference fringes. In order to obtain high… CONTINUE READING

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