Doppler writing and linewidth control for scanning beam interference lithography

  title={Doppler writing and linewidth control for scanning beam interference lithography},
  author={J. Montoya and Chih-Hao Chang and R. Heilmann and M. Schattenburg},
  journal={Journal of Vacuum Science \& Technology B},
Scanning beam interference lithography (SBIL) is a technique which is used to create large-area periodic patterns with high phase accuracy. This is accomplished by combining interference lithography and an X-Y scanning stage. We previously reported parallel scan mode in which the stage scans in a direction parallel to the interference fringes. Here we present a method called Doppler scanning. In this mode, the stage is scanned perpendicular to the interference fringes. In order to obtain high… Expand

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J. Vac. Sci. Technol. B
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J. Vac. Sci. Technol. B
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