Disorder effects in topological insulator thin films

  title={Disorder effects in topological insulator thin films},
  author={Yi Huang and B. I. Shklovskii},
  journal={Physical Review B},
Thin films of topological insulators (TI) attract large attention because of expected topological effects from the inter-surface hybridization of Dirac points. However, these effects may be depleted by unexpectedly large energy smearing $\Gamma$ of surface Dirac points by the random potential of abundant Coulomb impurities. We show that in a typical TI film with large dielectric constant $\sim 50$ sandwiched between two low dielectric constant layers, the Rytova-Chaplik-Entin-Keldysh… 
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