Directed self-assembly of block copolymers for use in bit patterned media fabrication

@inproceedings{Griffiths2013DirectedSO,
  title={Directed self-assembly of block copolymers for use in bit patterned media fabrication},
  author={Rhys Alun Griffiths and A. Williams and Chloe Oakland and J. Roberts and Aravind Vijayaraghavan and Thomas Thomson},
  year={2013}
}
Reduction of the bit size in conventional magnetic recording media is becoming increasingly difficult due to the superparamagnetic limit. Bit patterned media (BPM) has been proposed as a replacement technology as it will enable hard disk areal densities to increase past 1 Tb in−2. Block copolymer directed self-assembly (BCP DSA) is the leading candidate for forming BPM due to its ability to create uniform patterns over macroscopic areas. Here we review the latest research into two different BCP… CONTINUE READING
Highly Cited
This paper has 18 citations. REVIEW CITATIONS

Citations

Publications citing this paper.
Showing 1-10 of 13 extracted citations

References

Publications referenced by this paper.
Showing 1-10 of 158 references

Imprint lithography template technology for bit patterned media (BPM) Photomask

  • J Lille, K Patel, +6 authors T RAlbrecht
  • Technology 2011 vol 8166 ed W Maurer and F E…
  • 2011
Highly Influential
6 Excerpts

Nanoimprint lithography

  • S YChou, P RKrauss, P JRenstrom
  • J. Vac. Sci. Technol. B
  • 1996
Highly Influential
20 Excerpts

Generation and transfer of large area lithographic patterns in the ∼10 nm feature size regime SPIE Advanced Lithography

  • T RAlbrecht
  • 2013
Highly Influential
4 Excerpts

Nanofabricated and self-assembled magnetic structures as data storage media

  • B DTerris, T Thomson
  • J. Phys. D: Appl. Phys
  • 2005
Highly Influential
6 Excerpts

Precise control over molecular

  • E WEdwards, M FMontague, H HSolak, C JHawker, P FNealey
  • J. Phys. D: Appl. Phys
  • 2004
Highly Influential
20 Excerpts

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

  • L Wan, R Ruiz, +7 authors T RAlbrecht
  • J. Micro-Nanolithogr. MEMS and MOEMS
  • 2012
Highly Influential
4 Excerpts

Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition

  • R Ruiz, L Wan, +5 authors C TBlack
  • J. Vac. Sci. Technol. B
  • 2012
Highly Influential
4 Excerpts

Similar Papers

Loading similar papers…