Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching

  title={Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching},
  author={S. Archambault and C. Girardot and M. Sala{\"u}n and M. Delalande and S. Böhme and G. Cunge and E. Pargon and O. Joubert and M. Zelsmann},
  booktitle={Advanced Lithography},
Block CoPolymer (BCP) self-assembly creates periodical patterns with feature sizes eventually below 10 nm. On plain substrates, ordering is only obtained in grains not larger than a few micrometers but self-assembly in trenches of a pattern (using so-called graphoepitaxy technique) can create long-range order between the polymer micro-domains. As a result, such directed self-assembly (DSA) approaches may be used as ultra-high resolution patterning schemes in the microelectronics industry. Due… Expand
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Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces.
An alternative SAM/BCP approach to nanopattern formation shows promising results, pertinent in the field of nanotechnology, and with much potential for application, such as in the fabrication of nanoimprint lithography stamps, nanofluidic devices or in narrow and multilevel interconnected lines. Expand
Directed Self-Assembly of Liquid-Crystalline Molecular Building Blocks for Sub-5 nm Nanopatterning.
Recent progress toward the design of molecular building blocks is highlighted, with an emphasis on liquid crystals, to access sub-5 nm features, their directed self-assembly into oriented thin films, and, importantly, the fabrication of inorganic arrays. Expand
Smectic hybrid oligo(dimethylsiloxane) liquid crystal for nanopatterning
Block copolymer self-assembly is a candidate resolution enhancement technique for patterning at future technology nodes. The technology is based on the micro-phase separation of chemically immiscibleExpand


Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.
Block copolymer (BCP) microphase separation at substrate surfaces might enable the generation of substrate features in a scalable, bottom-up fashion, provided that the pattern structure, orientation,Expand
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
The control of order and orientation of the self-assembly of cylinder-forming poly(styrene-b-dimethylsiloxane) block copolymer is demonstrated. Copolymer thin films are spun-cast onto topographicallyExpand
A path to ultranarrow patterns using self-assembled lithography.
The templated self-assembly of block copolymer (BCP) thin films can generate regular arrays of 10-50 nm scale features with good positional and orientational accuracy, but the ordering, registrationExpand
Well-ordered thin-film nanopore arrays formed using a block-copolymer template.
In this communication, a simple route to fabricate thin films with well-ordered nanopores (antidot arrays) using self-assembled diblock copolymers is described. Expand
Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer.
This block copolymer system has excellent characteristics for self-assembled nanolithography applications and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. Expand
Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns
2009 WILEY-VCH Verlag Gmb Well-controlled monolayer patterns of microdomains of block copolymers (BCPs) have been widely pursued for applications in sub-30-nm nanolithography. BCP film processing isExpand
Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS-b-PDMS.
Density multiplication of polystyrene-block-polydimethylsiloxane (PS-b-PDMS) within both prepatterns was achieved by using a room temperature dynamic solvent annealing environment and etch resistance of the aligned polymer was evaluated. Expand
Achieving structural control with thin polystyrene- b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions
Abstract The structure of thin microphase-separated polystyrene- block -polydimethylsiloxane (PS–PDMS) films has been studied using state-of-the-art top-down and cross-sectional electron microscopy.Expand
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
One of the key challenges in nanotechnology is to control a self-assembling system to create a specific structure. Self-organizing block copolymers offer a rich variety of periodic nanoscaleExpand
Ordered block-copolymer assembly using nanoimprint lithography
Nanoimprint lithography and self-assembly of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer are combined to induce order in the phase-separated domains. Tailored periodicExpand