Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching

@inproceedings{Archambault2014DirectedSO,
  title={Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching},
  author={S. Archambault and C. Girardot and M. Sala{\"u}n and M. Delalande and S. Böhme and G. Cunge and E. Pargon and O. Joubert and M. Zelsmann},
  booktitle={Advanced Lithography},
  year={2014}
}
Block CoPolymer (BCP) self-assembly creates periodical patterns with feature sizes eventually below 10 nm. On plain substrates, ordering is only obtained in grains not larger than a few micrometers but self-assembly in trenches of a pattern (using so-called graphoepitaxy technique) can create long-range order between the polymer micro-domains. As a result, such directed self-assembly (DSA) approaches may be used as ultra-high resolution patterning schemes in the microelectronics industry. Due… Expand
3 Citations
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References

SHOWING 1-10 OF 27 REFERENCES
Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.
Block copolymer (BCP) microphase separation at substrate surfaces might enable the generation of substrate features in a scalable, bottom-up fashion, provided that the pattern structure, orientation,Expand
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
The control of order and orientation of the self-assembly of cylinder-forming poly(styrene-b-dimethylsiloxane) block copolymer is demonstrated. Copolymer thin films are spun-cast onto topographicallyExpand
A path to ultranarrow patterns using self-assembled lithography.
The templated self-assembly of block copolymer (BCP) thin films can generate regular arrays of 10-50 nm scale features with good positional and orientational accuracy, but the ordering, registrationExpand
Well-ordered thin-film nanopore arrays formed using a block-copolymer template.
TLDR
In this communication, a simple route to fabricate thin films with well-ordered nanopores (antidot arrays) using self-assembled diblock copolymers is described. Expand
Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer.
TLDR
This block copolymer system has excellent characteristics for self-assembled nanolithography applications and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. Expand
Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns
2009 WILEY-VCH Verlag Gmb Well-controlled monolayer patterns of microdomains of block copolymers (BCPs) have been widely pursued for applications in sub-30-nm nanolithography. BCP film processing isExpand
Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS-b-PDMS.
TLDR
Density multiplication of polystyrene-block-polydimethylsiloxane (PS-b-PDMS) within both prepatterns was achieved by using a room temperature dynamic solvent annealing environment and etch resistance of the aligned polymer was evaluated. Expand
Achieving structural control with thin polystyrene- b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions
Abstract The structure of thin microphase-separated polystyrene- block -polydimethylsiloxane (PS–PDMS) films has been studied using state-of-the-art top-down and cross-sectional electron microscopy.Expand
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
One of the key challenges in nanotechnology is to control a self-assembling system to create a specific structure. Self-organizing block copolymers offer a rich variety of periodic nanoscaleExpand
Ordered block-copolymer assembly using nanoimprint lithography
Nanoimprint lithography and self-assembly of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer are combined to induce order in the phase-separated domains. Tailored periodicExpand
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