Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design

@inproceedings{Ou2015DirectedSB,
  title={Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design},
  author={Jiaojiao Ou and Bei Yu and Jhih-Rong Gao and David Z. Pan and Moshe Preil and Azat Latypov},
  booktitle={ACM Great Lakes Symposium on VLSI},
  year={2015}
}
Unidirectional design has attracted lots of attention with the scaling down of technology nodes. However, due to the limitation of traditional lithography, printing the randomly distributed dense cuts becomes a big challenge for highly scaled unidirectional layout. Recently directed self-assembly (DSA) has emerged as a promising lithography technique candidate for cut manufacturing because of its ability to form small cylinders inside the guiding templates and the actual pattern size can be… CONTINUE READING

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