Corpus ID: 138245107

Direct-write deposition of silicon oxide: The express lane towards patterned thin films

@inproceedings{Wanzenboeck2003DirectwriteDO,
  title={Direct-write deposition of silicon oxide: The express lane towards patterned thin films},
  author={H. Wanzenboeck and S. Harasek and E. Bertagnolli and M. Gritsch and H. Hutter and J. Brenner and H. St{\"o}ri and Ulfried Grabner and G. Hammer and P. Pongratz},
  year={2003}
}
Silicon oxide manufactured by direct-write deposition has been used for rapid fabrication of already patterned thin films of a dielectric. This maskless method is capable of depositing structured features of silicon oxide within a single process step. Especially for 3-dimensional structures in microelectromechanical systems (MEMS) and in modification of microchip circuitry direct-write deposition is a serious alternative to the conventional approach using optical lithography and etching. A… Expand

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