Direct optimization approach for lithographic process conditions

@inproceedings{Fhner2007DirectOA,
  title={Direct optimization approach for lithographic process conditions},
  author={Tim F{\"u}hner and Andreas Erdmann and Sebastian Seifert},
  year={2007}
}
We present a semiautomatic procedure for the optimization of lithographic process conditions. In the regime of resolution enhancement techniques such as optical proximity correction, off-axis illumination, and phase shifting masks, the design of lithographic photomasks and illumination sources becomes increasingly intricate. Earlier "what you see is what you get" (WYSIWYG) approaches cannot be applied anymore. Instead, the employment of sophisticated design optimization tools is inevitable. In… CONTINUE READING

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