Direct fabrication of functional and biofunctional nanostructures through reactive imprinting.

Abstract

Nanoimprint lithography (NIL) [ 1 ] is an important tool for generating 2D and 3D structures beyond the resolution of optical lithography. NIL is a scalable technique and can be adapted to high throughput roll-to-roll processing. The versatility of the NIL has made it an attractive strategy for a wide range of applications such as organic electronics, [ 2… (More)
DOI: 10.1002/adma.201101292

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