Direct-Writing of Cu Nano-Patterns with an Electron Beam

@article{Lai2015DirectWritingOC,
  title={Direct-Writing of Cu Nano-Patterns with an Electron Beam},
  author={Shih-En Lai and Ying-Jhan Hong and Yu-Ting Chen and Yu-Ting Kang and Pin Chang and Tri‐Rung Yew},
  journal={Microscopy and Microanalysis},
  year={2015},
  volume={21},
  pages={1639 - 1643}
}
Abstract We demonstrate direct electron beam writing of a nano-scale Cu pattern on a surface with a thin aqueous layer of CuSO4 solution. Electron beams are highly maneuverable down to nano-scales. Aqueous solutions facilitate a plentiful metal ion supply for practical industrial applications, which may require continued reliable writing of sophisticated patterns. A thin aqueous layer on a surface helps to confine the writing on the surface. For this demonstration, liquid sample holder (K-kit… Expand
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