Direct Patterning of Nanoscale Cu2O Resistive Material for Soft Nanoelectronics

@inproceedings{Hong2012DirectPO,
  title={Direct Patterning of Nanoscale Cu2O Resistive Material for Soft Nanoelectronics},
  author={Sung Hoon Hong and Joong Yeon Cho and Ki Yeon Yang and Heon Min Lee},
  year={2012}
}
We demonstrate a simple direct nanoimprint lithography method of fabricating a copper oxide memory device for soft nanoelectronics. The process was done at room temperature with low pressure, so that a Cu2O resistive nanoarray could be fabricated not only on the Si substrate but also on the flexible polyimide substrate. The resistive switching of the fabricated 200 nm Cu2O nanopillar was observed at 2 V with a low current compliance of 5 µA from a high-resistance state to a low-resistance state… CONTINUE READING

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