Digital projection photochemical etching defines gray-scale features.

@article{Edwards2013DigitalPP,
  title={Digital projection photochemical etching defines gray-scale features.},
  author={Christopher F. Edwards and Kaiyuan Wang and Renjie Zhou and Basanta Bhaduri and Gabriel Popescu and Lynford L. Goddard},
  journal={Optics express},
  year={2013},
  volume={21 11},
  pages={
          13547-54
        }
}
We demonstrate a maskless photochemical etching method that is capable of performing one-step etching of multi-level structures. This method uses a digital projector to focus an image onto the sample and define the etching pattern. By combining digital projection photochemical etching with diffraction phase microscopy, etch heights can be measured in situ in a non-destructive manner. This method is single shot, eliminating the need for expensive gray-scale masks or laser scanning methods. The… CONTINUE READING

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Detecting 20 nm defects in large area nano - patterns using optical interferometric microscopy

  • C. Edwards Zhou, A. Arbabi, G. Popescu, L. L. Goddard
  • SPIE
  • 2013

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