Diamond mold for nanoimprint lithography

Abstract

Nanoimprint lithography (NIL) is a major breakthrough in nano-patterning because it can produce sub-10 nm feature size over a large area with a high throughput and low cost. NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity the mold requires durability for repeatedly… (More)

Topics

1 Figure or Table

Cite this paper

@article{Taniguchi2000DiamondMF, title={Diamond mold for nanoimprint lithography}, author={Junichi Taniguchi and Yoshiaki Tokano and Ichiko Miyamoto and Manaho Komuro and Hideo Hiroshima and K. Kobayashi and T. Miyazaki and Hideyuki Ohyi}, journal={Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)}, year={2000}, pages={190-191} }