Device and circuit implications of double-patterning — A designer's perspective

Abstract

Double-patterning lithography is a choice for critical layers in 32 nm and 22 nm technologies. Double patterning lithography techniques require additional masks to manufacture a single device layer. Consequently, double-patterning lithography brings overlay as a challenge that introduces additional variability to gate coupling capacitances. This additional… (More)
DOI: 10.1109/ISQED.2011.5770814

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