Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

@inproceedings{Shin2002DevelopmentOP,
  title={Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions},
  author={C.-S. Shin and Dietrich Gall and Y. W. Kim and Niklas Hellgren and Ivan Petrov and Joseph E. Greene},
  year={2002}
}
We have investigated the effects of low-energy ion irradiation on texture evolution during growth of B1–NaCl-structure polycrystalline d-TaN layers on SiO2 by ultra-high-vacuum reactive magnetron sputter deposition at 350 °C in mixed Ar 115%N2 discharges. In parallel sets of experiments, the ion-to-metal flux ratioJi /JTa was varied from 1.3 to 10.7 while maintaining the incident ion energy Ei constant at 20 eV, and Ei was varied from 8.5 to 30 eV withJi /JTa510.7. All TaN layers, irrespective… CONTINUE READING

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