Development of nanoimprint processes for photovoltaic applications

@article{Hauser2015DevelopmentON,
  title={Development of nanoimprint processes for photovoltaic applications},
  author={H. Hauser and N. Tucher and K. Tokai and P. Schneider and C. Wellens and A. Volk and Sonja Seitz and J. Benick and S. Barke and F. Dimroth and C. M{\"u}ller and T. Glinsner and B. Bl{\"a}si},
  journal={Journal of Micro/Nanolithography, MEMS, and MOEMS},
  year={2015},
  volume={14}
}
  • H. Hauser, N. Tucher, +10 authors B. Bläsi
  • Published 2015
  • Materials Science, Engineering
  • Journal of Micro/Nanolithography, MEMS, and MOEMS
Abstract. Due to its high resolution and applicability for large area patterning, nanoimprint lithography (NIL) is a promising technology for photovoltaic (PV) applications. However, a successful industrial application of NIL processes is only possible if large-area processing on thin, brittle, and potentially rough substrates can be achieved in a high-throughput process. The development of NIL processes using the SmartNIL technology from EV Group with a focus on PV applications is described… Expand
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TLDR
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