Development of compact gas cluster ion beam (GCIB) equipment and ultra-surface smoothing

@article{Hanazono2014DevelopmentOC,
  title={Development of compact gas cluster ion beam (GCIB) equipment and ultra-surface smoothing},
  author={Kouichi Hanazono and K. Tokiguchi and Izumi Kataoka},
  journal={2014 20th International Conference on Ion Implantation Technology (IIT)},
  year={2014},
  pages={1-3}
}
GCIB technology has been used for semiconductor, optical and magnetic device fabrications. It has also shown a possibility for nanometer level manufacturing. In recent requirement in materials processing, surface smoothing becomes important in a range of nanometer accuracy. This paper describes development of compact GCIB equipment for surface smoothing of… CONTINUE READING