Development of X-Shaped Filtered-Arc-Deposition (X-FAD) Apparatus and DLC/Cr Film Preparation

@article{Tanoue2007DevelopmentOX,
  title={Development of X-Shaped Filtered-Arc-Deposition (X-FAD) Apparatus and DLC/Cr Film Preparation},
  author={Hideto Tanoue and H. Hikosaka and Yuki Iwasaki and Hirofumi Takikawa and Toshiro Sakakibara and Yoshihiro Hasegawa},
  journal={IEEE Transactions on Plasma Science},
  year={2007},
  volume={35},
  pages={1014-1019}
}
An X-shaped filtered-arc-deposition (X-FAD) apparatus was developed in order to prepare hydrogen-free tetrahedral amorphous carbon (ta-C), which is a kind of diamond-like carbon (DLC), and metal film as a binding interlayer on the superhard alloy using a plasma beam irradiated from the same direction. First of all, the droplet-reduction performance was… CONTINUE READING