Determination of Trace Impurities in High-Purity Copper by Sequential ICP-OES with Axial Viewing

  • Peter S. Doidge
  • Published 2010

Abstract

The determination of trace impurities in high-purity metals and alloys is an important part of the quality-control process in the manufacture of these materials. Trace impurities can have major effects on the properties of the finished products, and in many cases it is desirable to minimize, or at least to be able to control, the levels of certain trace impurities. For example, the level of Ag and S in high-purity Cu wire may be required not to exceed 0.1 parts per million (ppm) [1].

Cite this paper

@inproceedings{Doidge2010DeterminationOT, title={Determination of Trace Impurities in High-Purity Copper by Sequential ICP-OES with Axial Viewing}, author={Peter S. Doidge}, year={2010} }