Detection of Sub-Design Rule Shorts for Process Development in Advanced Technology Nodes

@article{Lei2017DetectionOS,
  title={Detection of Sub-Design Rule Shorts for Process Development in Advanced Technology Nodes},
  author={Ming Lei and K. T. Wu},
  journal={IEEE Transactions on Semiconductor Manufacturing},
  year={2017},
  volume={30},
  pages={418-425}
}
  • Ming Lei, K. T. Wu
  • Published 2017 in IEEE Transactions on Semiconductor Manufacturing
Electric shorts down to atomic scale have emerged as the most critical yield detractors in advanced technology process development. In this paper, we demonstrate successful detection by various charging dynamic effects which stem from the transistor level response under electron beam exposure. We found that charging dynamic effects coupled with photon or scan direction are exceptionally useful for critical voltage contrast defect detection. Correlation with other characterization methods on the… CONTINUE READING