Design of beamline optics for EUVL.

Abstract

The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal… (More)

Cite this paper

@article{Watanabe1998DesignOB, title={Design of beamline optics for EUVL.}, author={T Watanabe and Tatsuya Haga and M. Niibe and Hiroyuki Kinoshita}, journal={Journal of synchrotron radiation}, year={1998}, volume={5 Pt 3}, pages={1149-52} }