Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor.

Abstract

We report the development of a novel portable atomic layer deposition chemical vapor deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of ALD/CVD mode in a single portable deposition system to fabricate multi-layer thin films over a broad range from "bulk-like" multi-micrometer to nanometer atomic dimensions. The precursor… (More)
DOI: 10.1063/1.4821081

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Cite this paper

@article{Selvaraj2013DesignAI, title={Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor.}, author={Sathees Kannan Selvaraj and Gregory M Jursich and Christos G. Takoudis}, journal={The Review of scientific instruments}, year={2013}, volume={84 9}, pages={095109} }