Deposition of aluminum-doped zinc oxide films by RF magnetron sputtering and study of their structural , electrical and optical properties

@inproceedings{Jeong2003DepositionOA,
  title={Deposition of aluminum-doped zinc oxide films by RF magnetron sputtering and study of their structural , electrical and optical properties},
  author={Seong Hun Jeong and Jae Won Lee and Shin Buhm Lee and Jonathan Boo},
  year={2003}
}
Highly oriented undoped and aluminum-doped ZnO (AZO) films in the (002) direction were prepared by RF magnetron sputtering on glass substrates with specifically designed ZnO targets containing different amounts of Al (OH) powder as doping 3 source. A systematic study of the influence of deposition parameters such as Al (OH) content in the target, the target–substrate 3 distance(D ), deposition time and substrate temperature on the structural, electrical and optical properties of the as-grown… CONTINUE READING
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Showing 1-7 of 7 references

Appl. Surf. Sci

  • D H Zhang, T L Yang, J Ma
  • Appl. Surf. Sci
  • 2000

Sol. Energy Mater

  • S Major, K L Chopra
  • Sol. Energy Mater
  • 1998

Phys. D: Appl. Phys. Mater. Res. Soc. Symp

  • K Ellmer
  • Phys. D: Appl. Phys. Mater. Res. Soc. Symp
  • 1997

Jpn. J. Appl. Phys. J. Electron. Mater. Thin Solid Films J. Appl. Phys. Thin Solid Films

  • T Minami, H Sonohara
  • Jpn. J. Appl. Phys. J. Electron. Mater. Thin…
  • 1987

Thin Solid Films J. Appl. Phys. J. Appl. Phys. Thin Solid Films

  • J Lodder, T Wielinga, J Worst
  • Thin Solid Films J. Appl. Phys. J. Appl. Phys…
  • 1983

J. Appl. Phys. Phys. Rev

  • Y Igasaki, H Saito
  • J. Appl. Phys. Phys. Rev
  • 1954

Appl. Surf. Sci. J. Phys. D: Appl. Phys

  • B J Lochande, M D Uplane
  • Appl. Surf. Sci. J. Phys. D: Appl. Phys
  • 1873

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