Demonstration of Sputtering Atomic Layer Augmented Deposition (SALAD): Aluminum Oxide-Copper Dielectric-Metal Nanocomposite Thin Films.

@article{Giraldo2020DemonstrationOS,
  title={Demonstration of Sputtering Atomic Layer Augmented Deposition (SALAD): Aluminum Oxide-Copper Dielectric-Metal Nanocomposite Thin Films.},
  author={Brian Giraldo and David M. Fryauf and Brandon Cheney and Jacob H. Sands and Nobuhiko P. Kobayashi},
  journal={ACS applied materials \& interfaces},
  year={2020}
}
Designing a thin film structure often begins with choosing a film deposition method that employs a specific process by which chemical species are formed and transported; in other words, a film deposition system in which two deposition methods are hybridized should lead to new ways of designing thin film structures. This premise inspires us to combine atomic layer deposition (ALD) and magnetron sputtering (SPU) within a single chamber - sputtering atomic layer augmented deposition (SALAD). SALAD… 

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