Degradation characteristics of humic acid during photo-Fenton processes.

Abstract

Changes in the molecular and structural characteristics of humic acid (HA) during photo-Fenton processes were studied. When aqueous solutions at pH 5.0, which contained HA, Fe(III), and H2O2, were irradiated (lambda > 370 nm), the concentrations of total organic carbon (TOC) decreased with increasing irradiation time, indicating that a portion of the HA was… (More)

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