Defect-tolerant extreme ultraviolet nanoscale printing.

Abstract

We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental… (More)
DOI: 10.1364/OL.37.003633

3 Figures and Tables

Cite this paper

@article{Urbanski2012DefecttolerantEU, title={Defect-tolerant extreme ultraviolet nanoscale printing.}, author={Lukasz Urbanski and A. Isoyan and Alexander Stein and J. J. Rocca and C. S. Menoni and M. C. Marconi}, journal={Optics letters}, year={2012}, volume={37 17}, pages={3633-5} }