Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser

@inproceedings{Suganuma1995DeepUVLU,
  title={Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser},
  author={Hiroshi Suganuma and Minoru Takeda and Michio Oka and Naoto Ozaki and Motohisa Haga and Shigeo Kubota},
  booktitle={Advanced Lithography},
  year={1995}
}
A new lithography technique using continuous wave (CW) 266 nm radiation from an all solid state frequency quadrupled Nd:YAG laser is described and demonstrated. This laser has proved to be a highly efficient and promising deep UV light source in fabrication of 0.25 micron design rule device. Furthermore, we obtained 0.2 micron L/S pattern with phase shift mask. Speckle free images are obtained with rotating diffuser. The performance and potential of this new laser as a light source of… CONTINUE READING

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