Deep-UV Excimer Lasers

Abstract

The recent trend in microelectronics towards patterning critical feature sizes of 0.25 m and below has motivated the development of microlithography at the deep ultra-violet (DUV) laser wavelengths of 248 and 1 93 nm. In recent years the performance, reliability, and cost of ownership of excimer light sources have improved. Some key technologies needed for… (More)

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