Curvature Enhanced Adsorbate Coverage Model for Electrodeposition

  title={Curvature Enhanced Adsorbate Coverage Model for Electrodeposition},
  author={Thomas P. Moffat and Daniel Wheeler and Soo‐Kil Kim and Daniel Josell},
  journal={Journal of The Electrochemical Society},
The influence of a catalyst deactivating leveling additive in electrodeposition is explored in the context of the previously developed curvature enhanced accelerator coverage model of superconformal film growth. Competitive adsorption between a rapidly adsorbed suppressor, rate accelerating catalyst, and catalyst-deactivating leveler is examined. Rate equations are formulated where the leveling agent is capable of deactivating the adsorbed catalyst by either direct adsorption from the… 

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