Cross-Bridge Kelvin Resistor Structures for Reliable Measurement of Low Contact Resistances and Contact Interface Characterization

@article{Stavitski2009CrossBridgeKR,
  title={Cross-Bridge Kelvin Resistor Structures for Reliable Measurement of Low Contact Resistances and Contact Interface Characterization},
  author={N. Stavitski and J. Klootwijk and H. V. van Zeijl and A. Kovalgin and R. Wolters},
  journal={IEEE Transactions on Semiconductor Manufacturing},
  year={2009},
  volume={22},
  pages={146-152}
}
The parasitic factors that strongly influence the measurement accuracy of Cross-Bridge Kelvin Resistor (CBKR) structures for low specific contact resistances (¿c) have been extensively discussed during last few decades and the minimum of the ¿c value, which could be accurately extracted, was estimated. We fabricated a set of various metal-to-metal CBKR structures with different geometries, i.e., shapes and dimensions, to confirm this limit experimentally and to create a method for contact metal… Expand
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