Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair

  title={Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair},
  author={Aneta S. Stod{\'o}lna and Tiago de Faria Pinto and Faisal Ali and Alex Bayerle and Dmitry Kurilovich and Jan Mathijssen and Ronnie Hoekstra and Oscar O. Versolato and Kjeld S. E. Eikema and Stefan Witte},
  journal={Journal of Applied Physics},
The next generation of lithography machines uses extreme ultraviolet (EUV) light originating from laser-produced plasma (LPP) sources, where a small tin droplet is ionized by an intense laser pulse to emit the requested light at 13.5 nm. Numerous irradiation schemes have been explored to increase conversion efficiency (CE), out of which a double-pulse approach comprising a weak picosecond Nd:YAG pre-pulse followed by a powerful pulse is considered to be very promising [1]. Nevertheless, even… 

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